X-ray photoelectron spectroscopic study of magnetron sputtered carbon-nickel composite films

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7942-7946

  Kovacs Gy J ^a   Bertoti I ^b   Radnoczi G ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b CHEMICAL RESEARCH CENTER   (Hungary)

Author keywords

Carbon metal composite; Carbon nickel composite film; Transmission electron microscopy (TEM); X ray photoelectron spectroscopy (XPS)

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; ARGON; CARBIDES; CARBON; CARBON FILMS; HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INERT GASES; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC MATRIX COMPOSITES; NICKEL; NICKEL ALLOYS; PLASMA DIAGNOSTICS; SPECTROSCOPIC ANALYSIS; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON MATRIX; ARGON PLASMAS; CARBON-METAL COMPOSITE; CARBON-NICKEL COMPOSITE FILM; CRYSTALLINE PHASE; DIRECT CURRENT MAGNETRON SPUTTERING; DISPERSED PHASE; NANO-CRYSTALLINE; NICKEL CARBIDE; NICKEL FILMS; SELECTED AREA ELECTRON DIFFRACTION; SPECTROSCOPIC STUDIES; TRANSMISSION ELECTRON MICROSCOPY (TEM); X-RAY PHOTOELECTRON SPECTROSCOPY (XPS);

COMPOSITE FILMS;

EID: 49349117148     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.005     Document Type: Article

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