CVD of TiCx/a-C-layers under d.c.-pulse discharge

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 186-190

  Leonhardt, A ^a   Liepack, H ^a   Bartsch, K ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC DISCHARGES; MICROHARDNESS; TRANSMISSION ELECTRON MICROSCOPY;

PULSE DISCHARGES;

TITANIUM CARBIDE;

VAPOR DEPOSITION;

EID: 0034310613     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00962-2     Document Type: Article

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