The structure and field emission enhancement properties of nano-structured flower-like graphitic films

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7685-7688

  Deng, Jicai ^a,b   Zhang, Lan ^b   Zhang, Binglin ^a   Yao, Ning ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b ZHENGZHOU UNIVERSITY   (China)

Author keywords

Field emission; Microwave plasma chemical vapor deposition system; Nano crystalline graphitic film

Indexed keywords

CARBON; CARBON CLUSTERS; CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; CHROMIUM; CRYSTALLINE MATERIALS; CURRENT DENSITY; EMISSION SPECTROSCOPY; FIELD EMISSION; MAGNETRON SPUTTERING; MICROSCOPES; MICROWAVES; MOLECULAR BEAM EPITAXY; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NICKEL; PLASMA DEPOSITION; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

CERAMIC SUBSTRATES; FIELD EMISSION PROPERTIES; FIELD EMISSIONS; GRAPHITIC FILMS; MAGNETRON SPUTTERING METHOD; MEASUREMENT RESULTS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM; NANO-CRYSTALLINE; NANO-CRYSTALLINE GRAPHITIC FILM; NANO-STRUCTURED; RAMAN SPECTRUM; SCANNING ELECTRON MICROSCOPES; TRANSMISSION ELECTRON MICROSCOPE; TURN-ON FIELD; X-RAY DIFFRACTION;

GRAPHITE;

EID: 49349107947     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.03.019     Document Type: Article

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