Plasma enhanced chemical vapor deposition of Cr2O3 thin films using chromium hexacarbonyl (Cr(CO)6) precursor

Thin Solid Films

Volumn 516, Issue 21, 2008, Pages 7366-7372

  Wang, Jinwen ^a   Gupta, Arunava ^a   Klein, Tonya M ^a  

^a University of Alabama   (United States)

Author keywords

Chromium hexacarbonyl; Cr2O3; Epitaxy; Plasma enhanced chemical vapor deposition

Indexed keywords

CHROMIUM; PLASMA DEPOSITION;

CHROMIUM HEXACARBONYL; CHROMIUM OXIDE; CR2O3; EPITAXY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 49349099462     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.02.027     Document Type: Article

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