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Volumn 386-388, Issue , 2002, Pages 353-358
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Preparation and characterization of Cr-O films grown by low-temperature chemical vapor deposition
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Author keywords
Chemical vapor deposition CVD; Chromium oxide films; Corrosion
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Indexed keywords
AGGLOMERATION;
CHEMICAL VAPOR DEPOSITION;
CORROSION RESISTANCE;
FILM GROWTH;
FILM PREPARATION;
LOW TEMPERATURE EFFECTS;
MORPHOLOGY;
PRESSURE CONTROL;
SCANNING ELECTRON MICROSCOPY;
STAINLESS STEEL;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
CHROMIUM OXIDE;
COLUMNAR STRUCTURE;
DEPOSITION TEMPERATURES;
FILM THICKNESS;
MORPHOLOGICAL CHARACTERIZATION;
PRECURSOR;
CHROMIUM COMPOUNDS;
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EID: 0036169752
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.386-388.353 Document Type: Conference Paper |
Times cited : (4)
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References (7)
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