Variable wave plate via tunable form-birefringent structures

Journal of Microelectromechanical Systems

Volumn 17, Issue 4, 2008, Pages 1039-1046

  Wilson, Benjamin K ^a   Lin, Lih Y ^a  

^a University of Washington   (United States)

Author keywords

Form birefringence; Nanoimprint lithography (NIL); Optical polarization; Tunable wave plate

Indexed keywords

BIREFRINGENCE; DEGREES OF FREEDOM (MECHANICS); ELECTROSTATIC ACTUATORS; LITHOGRAPHY; MECHANICAL PROPERTIES; MICROCHANNELS; NANOIMPRINT LITHOGRAPHY; OPTICAL DESIGN; OPTICAL PROPERTIES; SEMICONDUCTING CADMIUM TELLURIDE; SPEED;

FORM BIREFRINGENCE; GRATING STRUCTURES; LOW-COST DESIGN; NANO IMPRINTS; NANOIMPRINT LITHOGRAPHY (NIL); OPERATING PRINCIPLES; OPTICAL POLARIZATION; OPTICAL-; PERIODIC SUBWAVELENGTH STRUCTURE; POLYDIMETHYLSILOXANE PDMS; RIGOROUS COUPLED-WAVE ANALYSIS; STRUCTURAL MECHANICS; STRUCTURE GEOMETRIES; TRANSPARENT ELECTRODES; TUNABLE WAVE PLATE; WAVE PLATES;

PLATES (STRUCTURAL COMPONENTS);

EID: 49149101700     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2008.927744     Document Type: Article

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