Characterization of carbon nitride deposition from CH#14#2/N#12#2 glow discharge plasma beams using optical emission spectroscopy

Physics of Plasmas

Volumn 15, Issue 7, 2008, Pages

  Hu, Wei ^a   Tang, Jun Yi ^a   Wu, Jia Da ^a   Sun, Jian ^a   Shen, Yi Qun ^a   Xu, Xiao Feng ^a   Xu, Ning ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; CARBON; CARBON FILMS; CARBON NITRIDE; DISCHARGE (FLUID MECHANICS); EMISSION SPECTROSCOPY; GLOW DISCHARGES; LIGHT EMISSION; METHANE; MOLECULAR SPECTROSCOPY; NITRIDES; OPTICAL EMISSION SPECTROSCOPY; PHOTORESISTS; PLASMA DEPOSITION; PLASMAS; SPECTRUM ANALYSIS;

ABNORMAL GLOW DISCHARGE; AS-DEPOSITED; CN RADICALS; CRYSTALLINE FEATURES; EMISSION LINES; GLOW DISCHARGE PLASMA; MIXTURE RATIOS; NITRIDE DEPOSITION; OPTICAL EMISSION SPECTROSCOPY (OES);

ELECTRIC DISCHARGES;

EID: 49149100316     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2953521     Document Type: Article

References (16)

1. A. Y. Liu and M. L. Cohen, Science 247, 841 (1989).
2. E. Camps, L. Escobar-Alarcon, J. Lopez, G. Zambrano, and P. Prieto, AIP Conf. Proc. 875, 161 (2006).
3. W. Hu, N. Xu, Y. Q. Shen, and T. W. Zhang, Mater. Sci. Eng., A 432, 142 (2006).
4. N. Xu, Y. C. Du, Z. F. Ying, and F. M. Li, Appl. Phys. Lett. 69, 1364 (1996).
5. N. Xu, Y. C. Du, Z. F. Ying, Z. M. Ren, and F. M. Li, Rev. Sci. Instrum. 68, 2994 (1997).
6. H. Seo, J. H. Kima, K. H. Chung, J. Y. Kim, S. H. Kim, and H. Jeon, J. Appl. Phys. 98, 043308 (2005).
7. S. Veprek, J. Weidmann, and F. Glatz, J. Vac. Sci. Technol. A 13, 2914 (1995).
8. S. S. Harilal, R. C. Issac, C. V. Bindhu, V. P. N. Nampoori, and C. P. G. Vallabhan, J. Appl. Phys. 80, 3561 (1996).
9. A. A. Voevodin, J. G. Jones, J. S. Zabinski, and L. Hultman, J. Appl. Phys. 92, 724 (2002).
10. R. W. B. Pearse and A. G. Gaydon, The Identification of Molecular Spectra (Wiley, New York, 1976).
11. K. J. Clay, S. P. Speakman, G. A. J. Amaratunga, and S. R. P. Silva, J. Appl. Phys. 79, 1 (1996).
12. Y. Wei, W. Shu-fang, R. Guo-bin, L. Xiao-wei, Z. Lian-shui, and F. Guang-sheng, Spectrosc. Spectral Anal. (Beijing) 22, 79 (2002).
13. S. F. Durrant, N. Marcal, S. G. Castro, R. C. G. Vinhas, M. A. Bica de Moraes, and J. H. Nicola, Thin Solid Films 259, 139 (1995).
14. J. H. Choi, T. I. Lee, I. Han, H. K. Baik, K. M. Song, Y. S. Lim, and E. S. Lee, Plasma Sources Sci. Technol. 15, 416 (2006).
15. J. J. Cuomo, P. A. Leary, D. Yu, W. Reuter, and M. Frisch, J. Vac. Sci. Technol. 16, 299 (1979).
16. H. Riascos, G. Zambrano, P. Prieto, M. Arroyave, A. Devia, and H. Galindo, Surf. Coat. Technol. 188-189, 617 (2004).