SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 93, Issue 4, 2008, Pages

Optimum channel thickness of rubrene thin-film transistors

(2) Choi, Jeong M a Im, Seongil a

a Yonsei University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; NANOCRYSTALLINE ALLOYS; SEMICONDUCTING ORGANIC COMPOUNDS; SILICON; THERMAL EVAPORATION; THIN FILM DEVICES; THIN FILM TRANSISTORS; TRANSISTORS;

CHANNEL THICKNESS; FIELD-EFFECT MOBILITIES; PARASITIC RESISTANCES; RUBRENE; SELF-ASSEMBLED;

FIELD EFFECT TRANSISTORS;

EID: 49149096155 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2966354 Document Type: Article

Times cited : (10)

References (15)

1
- 34548269175
- 0003-6951 10.1063/1.2772752.
- J. -M. Choi, J. H. Kim, and S. Im, Appl. Phys. Lett. 0003-6951 10.1063/1.2772752 91, 083504 (2007).
- (2007) Appl. Phys. Lett. , vol.91 , pp. 083504
- Choi, J.-M.¹ Kim, J.H.² Im, S.³

2
- 17444403170
- 0003-6951 10.1063/1.1898429.
- C. Santato, I. Manunza, A. Bonfiglio, F. Cicoira, P. Cosseddu, R. Zamboni, and M. Muccini, Appl. Phys. Lett. 0003-6951 10.1063/1.1898429 86, 141106 (2005).
- (2005) Appl. Phys. Lett. , vol.86 , pp. 141106
- Santato, C.¹ Manunza, I.² Bonfiglio, A.³ Cicoira, F.⁴ Cosseddu, P.⁵ Zamboni, R.⁶ Muccini, M.⁷

3
- 33847111592
- 0028-0836 10.1038/nature05533.
- H. Klauk, U. Zschieschang, J. Pflaum, and M. Halik, Nature (London) 0028-0836 10.1038/nature05533 445, 745 (2007).
- (2007) Nature (London) , vol.445 , pp. 745
- Klauk, H.¹ Zschieschang, U.² Pflaum, J.³ Halik, M.⁴

4
- 34547373249
- 0003-6951 10.1063/1.2749092.
- R. D. Yang, T. Gredig, C. N. Colesniuc, J. Park, I. K. Schuller, W. C. Trogler, and A. C. Kummel, Appl. Phys. Lett. 0003-6951 10.1063/1.2749092 90, 263506 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 263506
- Yang, R.D.¹ Gredig, T.² Colesniuc, C.N.³ Park, J.⁴ Schuller, I.K.⁵ Trogler, W.C.⁶ Kummel, A.C.⁷

5
- 33846941529
- 0003-6951 10.1063/1.2450646.
- S. Jung, T. Ji, and V. K. Varadan, Appl. Phys. Lett. 0003-6951 10.1063/1.2450646 90, 062105 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 062105
- Jung, S.¹ Ji, T.² Varadan, V.K.³

6
- 23244459722
- 1476-1122 10.1038/nmat1426.
- N. Stingelin-Stutzmann, E. Smits, H. Wondergem, C. Tanase, P. Blom, P. Smith, and D. D. Leeuw, Nat. Mater. 1476-1122 10.1038/nmat1426 4, 601 (2005).
- (2005) Nat. Mater. , vol.4 , pp. 601
- Stingelin-Stutzmann, N.¹ Smits, E.² Wondergem, H.³ Tanase, C.⁴ Blom, P.⁵ Smith, P.⁶ Leeuw, D.D.⁷

7
- 1542723292
- 0036-8075 10.1126/science.1094196.
- V. C. Sundar, J. Zaumseil, V. Podzorov, E. Menard, R. L. Willett, T. Someya, M. E. Gershenson, and J. A. Rogers, Science 0036-8075 10.1126/science.1094196 303, 1644 (2004).
- (2004) Science , vol.303 , pp. 1644
- Sundar, V.C.¹ Zaumseil, J.² Podzorov, V.³ Menard, E.⁴ Willett, R.L.⁵ Someya, T.⁶ Gershenson, M.E.⁷ Rogers, J.A.⁸

8
- 33751080600
- 0003-6951 10.1063/1.2388151.
- C. Reese, W. -J. Chung, M. -M. Ling, M. Roberts, and Z. Bao, Appl. Phys. Lett. 0003-6951 10.1063/1.2388151 89, 202108 (2006).
- (2006) Appl. Phys. Lett. , vol.89 , pp. 202108
- Reese, C.¹ Chung, W.-J.² Ling, M.-M.³ Roberts, M.⁴ Bao, Z.⁵

9
- 34547206187
- 0031-8965 10.1002/pssa.200675340.
- Y. Luo, M. Brun, P. Rannou, and B. Grevin, Phys. Status Solidi A 0031-8965 10.1002/pssa.200675340 204, 1851 (2007).
- (2007) Phys. Status Solidi A , vol.204 , pp. 1851
- Luo, Y.¹ Brun, M.² Rannou, P.³ Grevin, B.⁴

10
- 23844540635
- 1463-9076 10.1039/b507620j.
- D. Käfer and G. Witte, Phys. Chem. Chem. Phys. 1463-9076 10.1039/b507620j 7, 2850 (2005).
- (2005) Phys. Chem. Chem. Phys. , vol.7 , pp. 2850
- Käfer, D.¹ Witte, G.²

11
- 0038166414
- 0003-6951 10.1063/1.1580993.
- J. Lee, K. Kim, J. H. Kim, S. Im, and D. -Y. Jung, Appl. Phys. Lett. 0003-6951 10.1063/1.1580993 82, 4169 (2003).
- (2003) Appl. Phys. Lett. , vol.82 , pp. 4169
- Lee, J.¹ Kim, K.² Kim, J.H.³ Im, S.⁴ Jung, D.-Y.⁵

12
- 20644459026
- 0021-8979 10.1063/1.1862767.
- N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C. -H. Park, and D. A. Keszler, J. Appl. Phys. 0021-8979 10.1063/1.1862767 97, 064505 (2005).
- (2005) J. Appl. Phys. , vol.97 , pp. 064505
- Dehuff, N.L.¹ Kettenring, E.S.² Hong, D.³ Chiang, H.Q.⁴ Wager, J.F.⁵ Hoffman, R.L.⁶ Park, C.-H.⁷ Keszler, D.A.⁸

13
- 0342902208
- 0032-3861 10.1016/S0032-3861(01)00215-4.
- K. Taguchi, H. Miyaji, K. Izumi, A. Hoshino, Y. Miyamoto, and R. Kokawa, Polymer 0032-3861 10.1016/S0032-3861(01)00215-4 42, 7443 (2001).
- (2001) Polymer , vol.42 , pp. 7443
- Taguchi, K.¹ Miyaji, H.² Izumi, K.³ Hoshino, A.⁴ Miyamoto, Y.⁵ Kokawa, R.⁶

14
- 12344331262
- 0947-8396 10.1007/s00339-003-2346-7.
- O. Karthaus, T. Imai, J. Sato, S. Kurimura, and R. Nakamura, Appl. Phys. A: Mater. Sci. Process. 0947-8396 10.1007/s00339-003-2346-7 80, 903 (2005).
- (2005) Appl. Phys. A: Mater. Sci. Process. , vol.80 , pp. 903
- Karthaus, O.¹ Imai, T.² Sato, J.³ Kurimura, S.⁴ Nakamura, R.⁵

15
- 34547169908
- 0003-6951 10.1063/1.2756379.
- S. -W. Park, S. H. Jeong, J. -M. Choi, J. M. Hwang, J. H. Kim, and S. Im, Appl. Phys. Lett. 0003-6951 10.1063/1.2756379 91, 033506 (2007).
- (2007) Appl. Phys. Lett. , vol.91 , pp. 033506
- Park, S.-W.¹ Jeong, S.H.² Choi, J.-M.³ Hwang, J.M.⁴ Kim, J.H.⁵ Im, S.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.