Highly ordered diamond and hybrid triangle-diamond patterns in porous anodic alumina thin films

Applied Physics Letters

Volumn 93, Issue 4, 2008, Pages

  Smith, Joshua T ^a   Hang, Qingling ^a   Franklin, Aaron D ^a   Janes, David B ^a   Sands, Timothy D ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM SHEET; CELLULAR MANUFACTURING; DIAMONDS; FIELD EMISSION; ORE TREATMENT; THICK FILMS; THIN FILMS; TRIANGULATION;

ANODIZATION; CELL FORMATION; CROSS SECTIONING; FIELD EMISSIONS; HEXAGONAL CELL STRUCTURES; NANO SCALE APPLICATIONS; NONEQUILIBRIUM FORMATION; POROUS ANODIC ALUMINA; POROUS TEMPLATES; SELF-COMPENSATION; TRIANGULAR PORES;

DIAMOND FILMS;

EID: 49149092317     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2957991     Document Type: Article

References (24)

1. M. R. Maschmann, A. D. Franklin, A. Scott, D. B. Janes, T. D. Sands, and T. S. Fisher, Nano Lett. 6, 2712 (2006).
2. M. Lahav, E. A. Weiss, Q. Xu, and G. M. Whitesides, Nano Lett. 6, 2166 (2006).
3. O. Rabin, P. R. Herz, Y. M. Lin, A. I. Akinwande, S. B. Cronin, and M. S. Dresselhaus, Adv. Funct. Mater. 13, 631 (2003).
4. A. D. Franklin, M. R. Maschmann, M. DaSilva, D. B. Janes, T. S. Fisher, and T. D. Sands, J. Vac. Sci. Technol. B 25, 343 (2007).
5. S. Zhao, L. Clime, K. Chan, F. Normandin, H. Roberge, A. Yelon, R. W. Cochrane, and T. Veres, J. Nanosci. Nanotechnol. 7, 381 (2007).
6. H. Masuda, M. Yamada, F. Matsumoto, S. Yokoyama, S. Mashiko, M. Nakao, and K. Nishio, Adv. Mater. (Weinheim, Ger.) 18, 213 (2006).
7. H. Masuda, K. Yasui, and K. Nishio, Adv. Mater. (Weinheim, Ger.) 12, 1031 (2000).
8. C. Kim, T. Loedding, S. Jang, H. Zeng, Z. Li, Y. Sui, and D. J. Sellmyer, Appl. Phys. Lett. 91, 172508 (2007).
9. Z. Sun and H. K. Kim, Appl. Phys. Lett. 81, 3458 (2002).
10. R. Krishnan, H. Q. Nguyen, C. V. Thompson, W. K. Choi, and Y. L. Foo, Nanotechnology 16, 841 (2005).
11. Y. Lei, W. Cai, and G. Wilde, Prog. Mater. Sci. 52, 465 (2007).
12. F. Keller, M. S. Hunter, and D. L. Robinson, J. Electrochem. Soc. 100, 411 (1953).
13. H. Masuda, H. Asoh, M. Watanabe, K. Nishio, M. Nakao, and T. Tamamura, Adv. Mater. (Weinheim, Ger.) 13, 189 (2001).
14. L. J. Sherry, R. Jin, C. A. Mirkin, G. C. Schatz, and R. P. Van Duyne, Nano Lett. 6, 2060 (2006).
15. T. Yanagishita, M. Sasaki, K. Nishio, and H. Masuda, Adv. Mater. (Weinheim, Ger.) 16, 429 (2004).
16. K. Ebihara, H. Takahashi, and M. Nagayama, J. Met. Finish. Soc. Jpn. 34, 548 (1983).
17. W. Lee, R. Ji, C. A. Ross, U. Gösele, and K. Nielsch, Small 2, 978 (2006).
18. J. Broughton and G. A. Davies, J. Membr. Sci. 106, 89 (1995).
19. O. Jessensky, F. Müller, and U. Gösele, Appl. Phys. Lett. 72, 1173 (1998).
20. A. P. Li, F. Müller, and U. Gösele, Electrochem. Solid-State Lett. 3, 131 (2000).
21. G. E. Thompson and G. C. Wood, Anodic Films on Aluminum, in Treatise on Materials Science and Techology, edited by, J. Scully, (Academic, New York, 1983) Vol. 23, Chap, p. 205.
22. J. Choi, Y. Luo, R. B. Wehrspohn, R. Hillebrand, J. Schilling, and U. Gösele, J. Appl. Phys. 94, 4757 (2003).
23. K. Nielsch, J. Choi, K. Schwirn, R. B. Wehrspohn, and U. Gösele, Nano Lett. 2, 677 (2002).
24. H. Masuda, M. Yotsuya, M. Asano, and K. Nishio, Appl. Phys. Lett. 78, 826 (2001).