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Volumn , Issue , 2008, Pages 7-10

Channel backscattering characteristics of high performance germanium pMOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CARRIER MOBILITY; GERMANIUM; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; NONMETALS; SILICON;

EID: 49049121665     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULIS.2008.4527129     Document Type: Conference Paper
Times cited : (3)

References (17)
  • 6
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    • Elementary scattering theory of the Si MOSFET
    • M. Lundstrom, "Elementary scattering theory of the Si MOSFET," IEEE Electron Dev. Lett., 18, 361-363 (1997)
    • (1997) IEEE Electron Dev. Lett , vol.18 , pp. 361-363
    • Lundstrom, M.1
  • 8
    • 0036253371 scopus 로고    scopus 로고
    • Essential physics of carrier transport in nanoscale MOSFETs
    • M. Lundstrom, "Essential physics of carrier transport in nanoscale MOSFETs," IEEE Trans. Electron Dev., 49, 133-141 (2002)
    • (2002) IEEE Trans. Electron Dev , vol.49 , pp. 133-141
    • Lundstrom, M.1
  • 10
    • 3042887472 scopus 로고
    • Extension of McDougall-Stoner tables of the Fermi-Dirac functions
    • A. C. Beer, M. N. Chase and P. F. Choquard, "Extension of McDougall-Stoner tables of the Fermi-Dirac functions," Helv. Phys. Acta., 28, 529-542 (1955)
    • (1955) Helv. Phys. Acta , vol.28 , pp. 529-542
    • Beer, A.C.1    Chase, M.N.2    Choquard, P.F.3
  • 11
    • 3242671509 scopus 로고    scopus 로고
    • A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS
    • T. Ghani, et al., "A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS" IEDM Tech. Dig. 978 (2003)
    • (2003) IEDM Tech. Dig , vol.978
    • Ghani, T.1
  • 12
    • 17644429951 scopus 로고    scopus 로고
    • High performance CMOS fabricated on hybrid substrate with different crystal orientation
    • M. Yang et al. "High performance CMOS fabricated on hybrid substrate with different crystal orientation" IEDM Tech. Dig. 453 (2003)
    • (2003) IEDM Tech. Dig , vol.453
    • Yang, M.1
  • 13
    • 0033741127 scopus 로고    scopus 로고
    • Simulation of nanoscale MOSFETs: A scattering theory interpretation
    • Z. Ren and M. Lundstrom, "Simulation of nanoscale MOSFETs: a scattering theory interpretation," Superlattices and Microstruct., 27, 177-189 (2000)
    • (2000) Superlattices and Microstruct , vol.27 , pp. 177-189
    • Ren, Z.1    Lundstrom, M.2
  • 14
    • 33646021568 scopus 로고    scopus 로고
    • High-mobility ultrathin strained Ge MOSFETs on bulk and SOI with low band-to-band tunnelling leakage: Experiments
    • T. Krishnamohan, Z. Krivokapic, K. Uchida, Y. Nishi and K. C. Saraswat, "High-mobility ultrathin strained Ge MOSFETs on bulk and SOI with low band-to-band tunnelling leakage: experiments," IEEE Trans. Electron Dev., 53, 990-999 (2006)
    • (2006) IEEE Trans. Electron Dev , vol.53 , pp. 990-999
    • Krishnamohan, T.1    Krivokapic, Z.2    Uchida, K.3    Nishi, Y.4    Saraswat, K.C.5
  • 17
    • 34047267112 scopus 로고    scopus 로고
    • Experimental determination of the channel backscattering coefficient on 10-70 nm metal gate double gate transistors
    • V. Barrai, et al. "Experimental determination of the channel backscattering coefficient on 10-70 nm metal gate double gate transistors" Solid State Electronics 51 537 (2007)
    • (2007) Solid State Electronics , vol.51 , pp. 537
    • Barrai, V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.