Synthesis of photosensitive main chain cage silsesquioxane polymer

Journal of Photopolymer Science and Technology

Volumn 21, Issue 1, 2008, Pages 155-159

  Ishida, Yoshihito ^a   Hayakawa, Teruaki ^a   Kakimoto, Masa Aki ^a   Kimae, Youichi ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b CHISSO CORPORATION   (Japan)

Author keywords

Chemically amplified resist; Photosensitive; Polyhedral origomeric silsesquioxane (POSS)

Indexed keywords

EID: 49049097113     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.155     Document Type: Article

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