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Volumn 403, Issue 18, 2008, Pages 3027-3033
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Thickness dependence of optical parameters for ZnTe thin films deposited by electron beam gun evaporation technique
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Author keywords
Optical properties; Structure properties; ZnTe
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Indexed keywords
ABSORPTION;
CRYSTAL STRUCTURE;
DISPERSION (WAVES);
ELECTRON BEAMS;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ELECTRON GUNS;
ELECTRON OPTICS;
ENERGY DISSIPATION;
EVAPORATION;
GEOMETRICAL OPTICS;
GRAPHIC METHODS;
GUNS (ARMAMENT);
LIGHT REFRACTION;
MOISTURE;
MOLECULAR BEAM EPITAXY;
OPTICAL PROPERTIES;
OPTICAL VARIABLES CONTROL;
PARAMETER ESTIMATION;
PARTICLE BEAMS;
PLASMA DIAGNOSTICS;
REFRACTIVE INDEX;
REFRACTOMETERS;
STOICHIOMETRY;
THICK FILMS;
THIN FILMS;
VAPORS;
ZINC;
ZINC COMPOUNDS;
ABSORPTION REGIONS;
DEPOSITED FILMS;
DIELECTRIC CONSTANTS;
DIFFRACTION TECHNIQUES;
DISPERSION PARAMETERS;
ELECTRON BEAM GUN EVAPORATION;
ENERGY DISPERSIVE X-RAY SPECTROMETRY;
ENERGY LOSS FUNCTION;
EXTINCTION CO-EFFICIENT;
FILM-THICKNESS;
GLASS SUBSTRATES;
GRAPHICAL REPRESENTATIONS;
HIGH FREQUENCIES;
OPTICAL PARAMETERS;
OPTICAL RANGING;
OPTICAL TRANSMISSIONS;
OSCILLATOR STRENGTH;
REFLECTION SPECTRUM;
REFRACTIVE INDEX DISPERSION;
ROOM TEMPERATURES;
SINGLE-OSCILLATOR MODEL;
STRUCTURE PROPERTIES;
THICKNESS DEPENDENCES;
ZINC TELLURIDE;
ZNTE;
ZNTE THIN FILMS;
INTEGRATED OPTOELECTRONICS;
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EID: 48949098727
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2008.03.005 Document Type: Article |
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Times cited : (53)
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References (27)
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