O-terminated nano-diamond ISFET for applications in harsh environment

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1241-1247

  Dipalo, M ^a   Pietzka, C ^a   Denisenko, A ^a   El Hajj, H ^a   Kohn, E ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

Electrochemistry; Harsh environment; ISFET; NCD; Oxygen termination

Indexed keywords

BORON; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); CRYSTALLINE MATERIALS; DIAMOND FILMS; LITHOGRAPHY; MESFET DEVICES; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NONMETALS; OPTICAL DESIGN; OXYGEN; SILICON;

DELTA-DOPED; ELECTROCHEMISTRY; HARSH ENVIRONMENT; HARSH ENVIRONMENTS; HOT-FILAMENT CVD; ISFET; NANO DIAMONDS; NANO-CRYSTALLINE DIAMOND; NCD; OXYGEN TERMINATION; OXYGEN-TERMINATED SURFACES; PEAK CONCENTRATIONS; PH SENSING; SILICON SUBSTRATES;

DIAMONDS;

EID: 48849093565     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.106     Document Type: Article

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