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Volumn 147, Issue 11-12, 2008, Pages 498-500
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Optical studies of ZnO thin films grown on O- and H-plasma treated Al2O3 substrates by plasma-assisted molecular beam epitaxy
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Author keywords
A. Semiconductors; B. Epitaxy; D. Optical property
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CORUNDUM;
CRYSTAL ATOMIC STRUCTURE;
CRYSTAL GROWTH;
CRYSTAL STRUCTURE;
EPITAXIAL GROWTH;
HYDROGEN;
IMAGING TECHNIQUES;
LEAKAGE (FLUID);
METALLIC FILMS;
MICROSCOPIC EXAMINATION;
MOLECULAR BEAMS;
MOLECULAR DYNAMICS;
MOLECULAR OXYGEN;
NONMETALS;
OPTICAL FILMS;
OPTICAL MATERIALS;
OPTICAL PROPERTIES;
OXYGEN;
OXYGEN VACANCIES;
PLASMA APPLICATIONS;
PLASMAS;
POWDERS;
PULSED LASER DEPOSITION;
SAPPHIRE;
SCANNING PROBE MICROSCOPY;
SEMICONDUCTING CADMIUM TELLURIDE;
SEMICONDUCTING ZINC COMPOUNDS;
SEMICONDUCTOR QUANTUM WIRES;
SUBSTRATES;
THICK FILMS;
THIN FILMS;
ZINC ALLOYS;
ZINC OXIDE;
ATOMIC FORCE (AF);
COMPARATIVE ANALYSIS;
CRYSTAL QUALITIES;
DEEP LEVEL EMISSION (DLE);
EMISSION THRESHOLD;
EXCITONIC EMISSIONS;
HALL MEASUREMENTS;
HIGH RESOLUTION X RAY DIFFRACTION (HR XRD);
INTENSITY RATIOS;
LATTICE-MATCHING CONDITIONS;
OPTICAL (PET) (OPET);
OPTICAL STUDIES;
PLASMA TREATMENTS;
PLASMA-ASSISTED MOLECULAR BEAM EPITAXY (PA-MBE);
RADIATIVE RECOMBINATION (RR);
SAPPHIRE SUBSTRATES;
STRUCTURE QUALITY;
ZNO THIN FILMS;
MOLECULAR BEAM EPITAXY;
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EID: 48749087608
PISSN: 00381098
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ssc.2008.06.033 Document Type: Article |
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Times cited : (2)
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References (17)
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