In situ high temperature XRD studies of ZnO nanopowder prepared via cost effective ultrasonic mist chemical vapour deposition

Bulletin of Materials Science

Volumn 31, Issue 3, 2008, Pages 573-577

  Singh, Preetam ^a   Kumar, Ashvani ^a   Kaushal, Ajay ^a   Kaur, Davinder ^a   Pandey, Ashish ^a   Goyal, R N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

Author keywords

High temperature XRD; Ultrasonic mist chemical vapour deposition; ZnO nanopowder

Indexed keywords

ANNEALING; COST EFFECTIVENESS; CRYSTAL STRUCTURE; DIFFRACTION; FIELD EMISSION; HOLOGRAPHIC INTERFEROMETRY; LATTICE CONSTANTS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; POWDERS; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTING ZINC COMPOUNDS; ULTRASONICS; VACUUM; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC ALLOYS; ZINC OXIDE;

BAND GAPS; CHEMICAL VAPOUR DEPOSITION; FIELD EMISSIONS; HIGH TEMPERATURE X-RAY DIFFRACTION; HIGH TEMPERATURE XRD; HIGH-TEMPERATURE VACUUM ANNEALING; IN SITU HIGH TEMPERATURE XRD; IN-SITU; LARGE-AREA DEPOSITION; LATTICE PARAMETERS; LOW TEMPERATURE; PEAK POSITIONS; SYNTHESIZED POWDERS; TEMPERATURE DEPENDENCES; TRANSMISSION ELECTRON MICROSCOPY (TEM); ULTRASONIC MIST CHEMICAL VAPOUR DEPOSITION; UV-VISIBLE; XRD PATTERNS; ZNO NANOPOWDER;

CHEMICAL VAPOR DEPOSITION;

EID: 48449089698     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-008-0089-y     Document Type: Conference Paper

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