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Applied Physics A: Materials Science and Processing

Volumn 92, Issue 3, 2008, Pages 479-485

Potential and restriction of high resolution, high energy photoemission in 400-8,000 eV for studying strongly correlated electron systems

(1) Suga, Shigemasa a

a OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ELEMENTS; ELECTRON SPECTROSCOPY; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; ELECTRONS; EMISSION SPECTROSCOPY; HIGH ENERGY PHYSICS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; POTENTIAL ENERGY; POTENTIAL ENERGY SURFACES; SPECTRUM ANALYSIS; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

BULK ELECTRONIC STRUCTURES; BULK SENSITIVITY; EV REGION; HARD X-RAY (HXR); HEIDELBERG (CO); HIGH ENERGIES; HIGH ENERGY PHOTOELECTRONS; HIGH RESOLUTIONS; HIGH-ENERGY PHOTOEMISSION; LIGHT ELEMENTS; RECOIL EFFECTS; SOFT X RAY (SXR); SPECTRA (CO); STRONGLY CORRELATED ELECTRON SYSTEMS (SCES); SURFACE SENSITIVITY; VALENCE BAND (VB) SPECTRA;

PHOTOELECTRON SPECTROSCOPY;

EID: 48349138990 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4555-6 Document Type: Conference Paper

Times cited : (19)

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