In situ x-ray reflectivity studies of dynamics and morphology during heteroepitaxial complex oxide thin film growth

Journal of Physics Condensed Matter

Volumn 20, Issue 26, 2008, Pages

  Dale, Darren ^a,b   Suzuki, Y ^c   Brock, J D ^a,b  

^a Cornell University   (United States)

^b Department of Obstetrics Gynecology   (United States)

^c Lawrence Berkeley National Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMS; DIELECTRIC MATERIALS; ECOLOGY; EPITAXIAL GROWTH; FOURIER TRANSFORMS; LANTHANUM; MOLECULAR BEAM EPITAXY; REFLECTION; THICK FILMS; THIN FILM DEVICES; THIN FILMS; THREE DIMENSIONAL; X RAY DIFFRACTION;

ATOMIC SCALE ROUGHNESS; ATOMIC SCALES; COMPLEX OXIDES; FOURIER; HEIGHT DISTRIBUTION; HETERO EPITAXIAL GROWTH; HETEROEPITAXIAL; IN-SITU; LAYER BY LAYER (LBL); QUANTITATIVE ANALYSIS; REFLECTIVITY MODEL; REFRACTION EFFECTS; SPECULAR X RAY REFLECTIVITY (SXR); STRATIFIED MEDIUM; THIN FILM GROWTH; THREE-DIMENSIONAL (3D) GROWTH; TIME-RESOLVED; X RAY REFLECTIVITY (SXR);

FILM GROWTH;

EID: 48249083805     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/26/264008     Document Type: Article

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