Assessment of aluminum nitride films sputtered on iridium electrodes

Proceedings - IEEE Ultrasonics Symposium

Volumn , Issue , 2007, Pages 1401-1404

  Olivares, J ^a   Clement, M ^a   Iborra, E ^a   Gonzalez Castilla S ^a   Rimmer, N ^b   Rastogi, A ^b  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^b Aviza Technology Inc   (United States)

Author keywords

AlN; BAW resonators; Iridium electrodes; Sputtering

Indexed keywords

ALUMINA; ALUMINUM; ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; ELECTRODES; IRIDIUM; LIGHT METALS; METALLIZING; MICROSCOPIC EXAMINATION; NITRIDES; PIEZOELECTRICITY; SCANNING PROBE MICROSCOPY; SPUTTER DEPOSITION; SPUTTERING; SUBSTRATES; ULTRASONICS; X RAY ANALYSIS;

ALN; ALN FILMS; ALUMINUM NITRIDE; ALUMINUM NITRIDE FILMS; BAW DEVICES; BAW RESONATORS; C -AXIS; CRYSTAL QUALITIES; DEPOSITION CONDITIONS; IR ELECTRODE; IRIDIUM ELECTRODES; PIEZOELECTRIC RESPONSES; POLY-CRYSTALLINE; PRE TREATMENTS; SEED LAYERS; SUBSTRATE TEMPERATURE; X-RAY DIFFRACTION;

IMAGING TECHNIQUES;

EID: 48149087747     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULTSYM.2007.352     Document Type: Conference Paper

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2. www.nvaaotech.coin
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