Vortex generation and pixel calibration using a spatial light modulator for maskless lithography

2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS

Volumn , Issue , 2007, Pages 147-148

  Jung, Il Woong ^a   Wang, Jen Shiang ^a   Solgaard, Olav ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Maskless lithography; Pixel calibration; Spatial light modulator; Vortex via

Indexed keywords

AERIAL IMAGING; DEFOCUS; INTENSITY PROFILES; INTERNATIONAL CONFERENCES; MASKLESS LITHOGRAPHY; NANO-PHOTONICS; OPTICAL MASKLESS LITHOGRAPHY; OPTICAL MEMS; OPTICAL VORTICES; OPTIMIZED CONFIGURATION; PHASE SINGULARITIES; PHASE STEPPING; PIXEL CALIBRATION; SPATIAL LIGHT MODULATOR; VORTEX GENERATION; VORTEX VIA;

CALIBRATION; COMPOSITE MICROMECHANICS; COPYING; IMAGE ENHANCEMENT; LIGHT MODULATION; LIQUID MEMBRANES; LITHOGRAPHY; MEMS; MICROELECTROMECHANICAL DEVICES; MIRRORS; MODULATION; OPTICAL TESTING; PHOTONICS; PHOTORESISTS; PIXELS; VORTEX FLOW;

LIGHT MODULATORS;

EID: 48049124331     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/OMEMS.2007.4373883     Document Type: Conference Paper

References (4)

1. I. W. Jung et al, "Optical Pattern Generation Using Spatial Light Modulators for Maskless Lithography," JSTQE, vol. 13, pp. 147-154, March-April 2007
2. M. D. Levenson et al, "Optical Vortex Masks for Via Levels," JMMM, vol. 3, pp. 293-304, 2004
3. J. S. Wang, "High Resolution Optical Maskless Lithography Based On Micromirror Arrays," PhD Thesis, pp. 58-67, 2006
4. J. S. Wang et al, "Effects of Through-Focus Symmetry in Maskless Lithography Using Micromirror Arrays", JVST B, vol. 23, pp. 2738-2742, 2005