Optimization of Mueller matrix polarimeters in the presence of error sources

Optics Express

Volumn 16, Issue 15, 2008, Pages 11589-11603

  Twietmeyer, K M ^a   Chipman, R A ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERRORS; NUMBER THEORY; POLARIMETERS; POLARIZATION; SINGULAR VALUE DECOMPOSITION;

CONDITION NUMBERS; DESIGN PROCESS; ERROR SOURCES; MUELLER MATRIX; ORIENTATION ANGLES; POLARIZATION COMPONENTS; POLARIZATION ELEMENTS; VARIABLE RETARDER;

MATRIX ALGEBRA;

ALGORITHM; ARTICLE; ARTIFACT; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; PHOTOMETRY; QUALITY CONTROL; REFRACTOMETRY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY;

ALGORITHMS; ARTIFACTS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; PHOTOMETRY; QUALITY CONTROL; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY;

EID: 47849115938     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.011589     Document Type: Article

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