Variable incidence angle X-ray absorption fine structure spectroscopy: A zirconia film study

Talanta

Volumn 76, Issue 4, 2008, Pages 731-735

  Degueldre, Claude ^a   Kastoryano, Michael ^a   Dardenne, Kathy ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Film; Variable incidence; X ray absorption; Zirconium dioxide; Zirconium monoxide

Indexed keywords

ATOMIC PHYSICS; CHEMICAL ANALYSIS; FILMS; NANOSTRUCTURES; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; ZIRCONIA;

FRACTAL STRUCTURES; NORMAL INCIDENCE; VARIABLE INCIDENCE; VARIABLE INCIDENCE ANGLE; X RAY ABSORPTION FINE STRUCTURES; X-RAY ABSORPTION FINE STRUCTURE ANALYSIS; ZIRCONIUM DIOXIDE; ZIRCONIUM MONOXIDE;

X RAY ABSORPTION;

EID: 47549103692     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2008.04.043     Document Type: Article

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