Two methods to prepare nanorings/nanoholes for the fabrication of vertical nanotransistors

Nanotechnology

Volumn 19, Issue 31, 2008, Pages

  Peng, Xiaofeng ^a   Kamiya, Itaru ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLADDING (COATING); DEWATERING; ELECTRON DEVICES; FABRICATION; IMAGING TECHNIQUES; MICROSCOPIC EXAMINATION; NONMETALS; OPTICAL DESIGN; PLASMA DEPOSITION; SILICON; SILICON WAFERS; SPIN COATING; STRESSES; THICK FILMS; VAPOR DEPOSITION; VIBRATIONS (MECHANICAL);

HIGH FLEXIBILITY; INNER STRESSES; MECHANICAL VIBRATIONS; NANO CRYSTALS; NANO DEVICES; NANO-TRANSISTORS; PLASMA SPUTTERING; POLYSTYRENE (PS) BEADS; PS BEADS; SCANNING PROBE MICROSCOPY (SPM); SELF ASSEMBLED MONOLAYER (SAMS); SINGLE-ELECTRON DEVICE (SED); SPIN COATINGS; SUBSTRATE ROTATION;

SPUTTER DEPOSITION;

METAL; NANOCRYSTAL; NANOMATERIAL; OXIDE; POLYSTYRENE;

ARTICLE; DRY DEPOSITION; ENZYME SUBSTRATE; PARTICLE SIZE; PRIORITY JOURNAL; SCANNING PROBE MICROSCOPY; SEMICONDUCTOR; SHEAR FLOW; VIBRATION;

EID: 47249153099     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/31/315303     Document Type: Article

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