Hot-wire chemical vapor deposition of chalcogenide materials for phase change memory applications

Chemistry of Materials

Volumn 20, Issue 11, 2008, Pages 3557-3559

  Abrutis, Adulfas ^a   Plausinaitiene, Valentina ^a   Skapas, Martynas ^a   Wiemer, Claudia ^b   Salicio, Olivier ^b   Pirovano, Agostino ^c   Varesi, Enrico ^c   Rushworth, Simon ^d   Gawelda, Wojciech ^e   Siegel, Jan ^e  

^a VILNIUS UNIVERSITY   (Lithuania)

^b INFM   (Italy)

^c STMICROELECTRONICS   (Italy)

^d SAFC Hitech   (United Kingdom)

^e INSTITUTO DE ÓPTICA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GERMANIUM; LIQUID PHASE EPITAXY; METALLIZING; WIRE;

CHALCOGENIDE FILMS; CHALCOGENIDE MATERIALS; FUNCTIONAL PROPERTIES; HOT-WIRE CHEMICAL VAPOR DEPOSITION (HW-CVD); LIQUID INJECTIONS; MEMORY APPLICATIONS; PHASE CHANGES;

PHASE CHANGE MEMORY;

EID: 47049123024     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm8004584     Document Type: Article

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