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Volumn 82, Issue 11, 2008, Pages 1162-1167

Improved wide erosion nickel magnetron sputtering using an eccentrically rotating tilted center magnet

Author keywords

Eccentrically rotating magnet; Erosion; Magnetron sputtering; Nickel; Target utilization

Indexed keywords

EROSION; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; NICKEL;

EID: 46549088326     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.055     Document Type: Review
Times cited : (9)

References (7)
  • 6
    • 33646562527 scopus 로고    scopus 로고
    • Iseki T. Vacuum 80 (2006) 662-666
    • (2006) Vacuum , vol.80 , pp. 662-666
    • Iseki, T.1
  • 7
    • 52949113028 scopus 로고    scopus 로고
    • Iseki T, Maeda H, Itoh T. Wide erosion nickel magnetron sputtering using an eccentrically rotating center magnet. Vacuum, in press. doi:10.1016/j.vacuum.2008.03.073.
    • Iseki T, Maeda H, Itoh T. Wide erosion nickel magnetron sputtering using an eccentrically rotating center magnet. Vacuum, in press. doi:10.1016/j.vacuum.2008.03.073.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.