Production of pulsed, mass-selected beams of metal and semiconductor clusters

Review of Scientific Instruments

Volumn 79, Issue 6, 2008, Pages

  Kamalou, Omar ^a   Rangama, Jimmy ^a   Ramillon, Jean Marc ^a   Guinement, Patrick ^a   Huber, Bernd A ^a  

^a UNIVERSITÉ DE CAEN   (France)

Author keywords

[No Author keywords available]

Indexed keywords

METALS; SEMICONDUCTOR MATERIALS;

BEAM LINES; CLUSTER SOURCES; GAS CONDENSATION; PLASMA SPUTTERING; SEMICONDUCTOR CLUSTERS; SIZE RANGES; SMALL CLUSTERS; TIME-OF-FLIGHT (TOF);

ELECTRIC CONDUCTIVITY;

EID: 46449112480     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2937646     Document Type: Article

References (21)

1. C. Bŕchignac, Ph. Cahuzac, F. Carlier, C. Colliex, M. de Frutos, N. Ḱbli, J. Le Roux, A. Masson, and B. Yoon, Eur. Phys. J. D 16, 265 (2001).
2. S. Palomba and R. E. Palmer, J. Appl. Phys. 101, 044304 (2007).
3. Y. Nakayama, S. Houzumi, N. Toyoda, K. Mochji, T. Mitamura, and I. Yamada, Nucl. Instrum. Methods Phys. Res. B 241, 618 (2005).
4. W. A. de Heer, Rev. Mod. Phys. 65, 611 (1993).
5. H. Haberland, Clusters of Atoms and Molecules I, II (Springer, Berlin, 1995).
6. S. J. Carroll, P. Weibel, B. Von. Issendorff, L. Kuipers, and R. E. Palmer, J. Phys.: Condens. Matter 8, L617 (1996).
7. C. Bŕchignac, Ph. Cahuzac, F. Carlier, M. de Frutos, A. Masson, C. Mory, C. Colliex, and B. Yoon, Phys. Rev. B 57, R2084 (1998).
8. H. Hsieh, R. S. Averback, H. Sellers, and C. P. Flynn, Phys. Rev. B 45, 4417 (1992).
9. W. C. Wiley and I. H. McLaren, Rev. Sci. Instrum. 56, 159 (1955).
10. H. Haberland, M. Karrais, M. Mall, and Y. Thurner, J. Vac. Sci. Technol. A 10, 3266 (1992).
11. H. Fujita, S. Yagura, H. Ueno, and M. Nagano, J. Phys. D 19, 1699 (1986).
12. S. Pratontep, S. J. Carroll, C. Xirouchaki, M. Streun, and R. E. Palmer, Rev. Sci. Instrum. 76, 045103 (2005).
13. C. G. Ganqvist and R. A. Buhraman, J. Appl. Phys. 47, 2200 (1976).
14. C. Xirouchaki and R. E. Palmer, Philos. Trans. R. Soc. London, Ser. A 362, 117 (2004).
15. N. Toyoda, S. Houzumi, and I. Yamada, Nucl. Instrum. Methods Phys. Res. B 241, 609 (2005).
16. G. Vandoni, C. F́lix, R. Monot, J. Buttet, and W. Harbich, Chem. Phys. Lett. 229, 51 (1994).
17. Colutron Research Corporation, model 900 quadrupole ion deflector.
18. D. Bahat, O. Cheshonvosky, U. Even, N. Lavie, and Y. Magen, J. Phys. Chem. 91, 2460 (1987).
19. CANBERRA, Passivated Implanted Planar Silicon (PIPS) detectors.
20. D. A. Dahl, SIMION 3D version 7.0 user's manual, February 2000.
21. T. Bergen, X. Biquard, A. Brenac, F. Chandezon, D. Jalabert, H. Lebius, M. Maurel, E. Monnand, J. Opitz, A. Pesnelle, B. Pras, C. Ristori, J. C. Rocco, and B. A. Huber, Rev. Sci. Instrum. 70, 3244 (1999).