A microstructural observation of near-failure thermal barrier coating: A study by photostimulated luminescence spectroscopy and transmission electron microscopy

Thin Solid Films

Volumn 466, Issue 1-2, 2004, Pages 128-136

  Kempshall, B W ^a,c   Sohn, Y H ^a   Jha, S K ^a,d   Laxman, S ^a   Vanfleet, R R ^a,e   Kimmel, J ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b CATERPILLAR INC   (United States)

^c NanoSpective   (United States)

^d Surmet Corporation   (United States)

^e Brigham University   (United States)

Author keywords

Luminescence; Microstructure; Oxidation; Thermal barrier coatings; Transmission electron microscopy

Indexed keywords

ELECTRON DIFFRACTION; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; LUMINESCENCE; MICROSTRUCTURE; OXIDATION; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SUPERALLOYS; TRANSMISSION ELECTRON MICROSCOPY;

CONVERGENT BEAM ELECTRON DIFFRACTION (CBED); PHOTOSTIMULATED LUMINESCENCE SPECTROSCOPY (PSLS); SELECTED AREA DIFFRACTION (SAD); THERMALLY GROWN OXIDES (TGO);

THERMAL BARRIER COATINGS;

EID: 4644335450     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.046     Document Type: Article

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