Deposition and characterization of fine-grained W-Ni-C/N ternary films

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 944-948

  Cavaleiro, A ^a   Trindade, B ^a   Vieira, M T ^a  

^a UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

Sputtering; Substrate bias; Ternary films

Indexed keywords

AMORPHOUS FILMS; COMPOSITE BEAMS AND GIRDERS; CRYSTALLINE MATERIALS; METHANE; MICROHARDNESS; NITROGEN; PARTIAL PRESSURE; PRESSURE EFFECTS; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); TERNARY SYSTEMS; TUNGSTEN ALLOYS;

REACTIVE SPUTTERING; ULTRAMICROHARDNESS;

METALLIC FILMS;

EID: 0033312730     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00276-5     Document Type: Article

References (8)

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2. Trindade B., Vieira M.T. Acta Mater. 1999;. submitted.
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7. Vieira M.T., Trindade B., Ramos A.S., Fernandes J.V., Vieira M.F. Thin Solid Films. 343-344:1999;42.
8. Louro C., Cavaleiro A. Surf. Coat. Technol. 1999;. in press.