Deposition of 10-undecenoic acid self-assembled layers on H-Si(1 1 1) surfaces studied with AFM and FT-IR

Applied Surface Science

Volumn 238, Issue 1-4 SPEC. ISS., 2004, Pages 238-241

  Li, Y J ^a   Tero, R ^a   Nagasawa, T ^a   Nagata, T ^a   Urisu, T ^a  

^a INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

Author keywords

10 Undecenoic acid; AFM; FT IR; Self assembled layers; Si(1 1 1)

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; MULTILAYERS; SELF ASSEMBLY; SILICON; SOLUTIONS; SURFACE PHENOMENA; VAN DER WAALS FORCES;

10-UNDECENOIC ACID; GROWTH MECHANISM; SELF-ASSEMBLED LAYERS; SI(111);

SURFACE CHEMISTRY;

EID: 4644293554     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.233     Document Type: Conference Paper

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