|
Volumn 468, Issue 1-2, 2004, Pages 1-3
|
Reactive sputter deposition of epitaxial (001) CeO2 on (001) Ge
|
Author keywords
(001) Ge; Epitaxial (001) CeO2; Reactive sputter deposition
|
Indexed keywords
CERIUM COMPOUNDS;
CONDENSATION;
EPITAXIAL GROWTH;
GERMANIUM COMPOUNDS;
GIBBS FREE ENERGY;
PARTIAL PRESSURE;
POSITIVE IONS;
SPUTTER DEPOSITION;
THERMODYNAMIC PROPERTIES;
THIN FILMS;
VAPOR PRESSURE;
DIELECTRIC BUFFER LAYER;
NATIVE OXIDES;
REACTIVE SPUTTER DEPOSITION;
WATER VAPOR;
MOS DEVICES;
|
EID: 4644250934
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.02.105 Document Type: Article |
Times cited : (9)
|
References (11)
|