Growth of silicides and interdiffusion in the Mo-Si system

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 30, Issue 3, 1999, Pages 545-550

  Tortorici, P C ^a,b   Dayananda, M A ^a  

^a PURDUE UNIVERSITY   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

Diffusion Couple; Diffusion Zone; Interdiffusion Coefficient; Material Transaction; MoSi2 Layer

Indexed keywords

DIFFUSION; RATE CONSTANTS; SILICIDES; TEXTURES;

DIFFUSION COUPLE; DIFFUSION STRUCTURES; DIFFUSION ZONES; INTERDIFFUSION COEFFICIENTS; MATERIAL TRANSACTION; MO-SI SYSTEM; MOSI2 LAYER; SOLID DIFFUSIONS; SOLID-SOLID; TEMPERATURE RANGE;

ACTIVATION ENERGY;

EID: 85130771445     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-999-0046-4     Document Type: Article

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