Simultaneous growth mechanism of intermediate silicidesin MoSi2/Mo system

Surface and Coatings Technology

Volumn 148, Issue 2-3, 2001, Pages 129-135

  Yoon, Jin Kook ^a   Kim, Gyeung Ho ^a   Byun, Ji Young ^a   Kim, Jae Soo ^a   Choi, Chong Sool ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

Diffusion and phase transformation; Mo silicides; Simultaneous growth mechanism

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DIFFUSION; MICROANALYSIS; MOLYBDENUM COMPOUNDS; OPTICAL MICROSCOPY; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; TEXTURES; X RAY DIFFRACTION ANALYSIS;

ELECTRON PROBE MICROANALYSIS (EPMA); SILICIDES;

SILICON COMPOUNDS;

MOLYBDENUM;

EID: 0035803926     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01354-8     Document Type: Article

References (16)

1. Hochtemperature-Werkstoffe