Yield-centric layout optimization with precise quantification of lithographic yield loss

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Kobayashi, S ^a   Kyoh, S ^a   Kinoshita, K ^a   Urakawa, Y ^a   Morifuji, E ^a   Kuramoto, S ^b   Inoue, S ^a  

^a TOSHIBA CORPORATION   (Japan)

^b Takumi Technology KK   (Japan)

Author keywords

Design rule; DfM; Hot spot; Layout optimization; OPC; RET; Yield

Indexed keywords

AEROSPACE APPLICATIONS; ARCHITECTURAL DESIGN; COMPUTER NETWORKS; INDUSTRIAL ENGINEERING; LITHOGRAPHY; MICROFLUIDICS; OPTIMIZATION; PROCESS ENGINEERING; PRODUCTION ENGINEERING; TECHNOLOGY;

DESIGN DATA; DESIGN RULES; HOT SPOTTING; LAYOUT OPTIMIZATION; LITHOGRAPHIC YIELD; MANUFACTURING PROCESSES; MASK TECHNOLOGY; NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; PROCESS ENGINEERS;

PROCESS DESIGN;

EID: 45549096510     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793031     Document Type: Conference Paper

References (6)

1. S. Inoue et al., "Total hot spot management from design rule definition to silicon fabrication", Electronic Design Processes Workshop EDP, April 2003, Monterey CA
2. T. Kotani et al., "Development of hot spot fixer", Proc. SPIE Vol. 6156-51 (2006)
3. S. Kyoh et al., "Lithography oriented DfM for 65nm and beyond" Proc. SPIE Vol. 6156-14 (2006)
4. S. Kobayashi et al, "Automated Hot-Spot Fixing System Applied for Metal Layers of 65 nm Logic Devices", Proc. SPIE Vol. 6283-101 (2006)
5. S. Kobayashi et al, "Process Window Aware Layout Optimization Using Hot Spot Fixing System" Proc. SPIE Vol. 6521-652110B (2007)
6. S. Kyoh et al., "Systematic yield estimation method with lithography simulation", Proc. SPIE Vol.6925-25 (2008), to be published.