Lithography oriented DfM for 65nm and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Kyoh, S ^a   Kotani, T ^a   Kobayashi, S ^a   Ikeuchi, A ^a   Inoue, S ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Design rule; DfM; Hot spot fixing; Layout modification

Indexed keywords

OPTICAL DESIGN; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; OPTICAL VARIABLES CONTROL;

DESIGN RULE; DFM; HOT SPOT FIXING; LAYOUT MODIFICATION;

PHOTOLITHOGRAPHY;

EID: 33745779654     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656858     Document Type: Conference Paper

References (4)

1. T. Kotani et al, "Yield enhanced layout generation by new design for manufacturability", Proc. SPIE Vol. 5379 (2003)
2. S. Inoue, "Patterning friendly design methodology for 65nm and beyond technology nodes", 8th International Forum on Semiconductor Technology IFST, June 2005, JAPAN
3. S. Inoue et al, "Total hot spot management from design rule definition to silicon fabrication", Electronic Design Processes Workshop EDP, April 2003, Monterey CA
4. T.Kotani et al, "Development of hot spot fixer", Proc. SPIE (2006), to be published