Fine pixel SEM image for mask pattern quality assurance based on lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Yamanaka, Eiji ^a   Kariya, Mitsuyo ^a   Yamaguchi, Shinji ^a   Tanaka, Satoshi ^a   Hashimoto, Kohji ^a   Itoh, Masamitsu ^a   Kobayashi, Hideaki ^b   Kawashima, Tsukasa ^b   Narukawa, Shogo ^b  

^a TOSHIBA CORPORATION   (Japan)

^b NONE

Author keywords

Edge extraction; Hotspot; Lithography simulation; Optical proximity correction (OPC); SEM

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; MASKS; OPTIMIZATION; QUALITY ASSURANCE; SCANNING ELECTRON MICROSCOPY;

EDGE EXTRACTION; HOTSPOT; IMAGE RESOLUTION; LITHOGRAPHY SIMULATION; OPTICAL PROXIMITY CORRECTION (OPC);

LITHOGRAPHY;

EID: 33748051084     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681788     Document Type: Conference Paper

References (2)

1. Mitsuyo Kariya et al., "Reticle SEM specifications required for lithography simulation", SPIE Vol.5853, p550-555, 2005
2. Mitsuyo Kariya et al., "Mask Pattern Quality Assurance based on Lithography Simulation with Fine Pixel SEM Image", SPIE Vol.5992, 5992-59, 2005