Studies of high index immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Ohmura, Yasuhiro ^a   Nagasaka, Hiroyuki ^a   Matsuyama, Tomoyuki ^a   Nakashima, Toshiharu ^a   Kobayashi, Teruki ^a   Ueda, Motoi ^a   Owa, Soichi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

High index fluid; High index immersion lithography; High index lens material; Polarization aberration

Indexed keywords

ARCHITECTURAL DESIGN; COMPUTER NETWORKS; FLUIDICS; INDUSTRY; PAPER COATING; SODIUM; TECHNOLOGY;

(OTDR) TECHNOLOGY; CHIP MAKING; CURRENT STATUS; DESIGN FEASIBILITY; HIGH INDEX; HIGH-INDEX FLUIDS; IMMERSION LITHOGRAPHY (IML); MATERIAL DEVELOPMENTS; NA EXPANSION; NEXT-GENERATION LITHOGRAPHY (NGL); OPTICAL MICRO LITHOGRAPHY; WATER IMMERSION LITHOGRAPHY;

LITHOGRAPHY;

EID: 45449117272     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771622     Document Type: Conference Paper

References (11)

1. Y. Ohmura, "The optical design for microlithographic lenses", SPIE Vol. 6342, (2006)
2. S. Peng, et al., "Second generation fluids for 193nm immersion lithography", SPIE Vol. 5754, (2005)
3. T. Miyamatsu, et al., "Material design for immersion lithography with high refractive index fluid (HIF)", SPIE Vol. 5753, (2005)
4. T. Nawata, et al., "High index fluoride materials for 193nm immersion lithography", SPIE Vol. 6154, (2006)
5. J.H.Burnett et al., "High-index optical materials for 193-nm immersion lithography", SPIE Vol. 6154, (2006)
6. J. L. Gejo, et al., "Outlook for potential third generation immersion fluids", Litho Forum 2006
7. nd International Symposium on 157nm Lithography, (2001)
8. th International Symposium on immersion lithography, (2007)
9. K. Matsumoto, et al., "Analysis of imaging performance degradation", SPIE Vol. 5040, (2003)
10. M. Shibuya, et al., "Random aberration and local flare", SPIE Vol. 5377, (2004)
11. th International Symposium on immersion lithography, (2007)