Impact of optimization conditions on the result at optimizing illumination and mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Tsujita, Koichiro ^a   Mikami, Koji ^a   Ishii, Hiroyuki ^a   Suzuki, Akiyoshi ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; AEROSPACE APPLICATIONS; ARCHITECTURAL DESIGN; LANDING; LITHOGRAPHY; NUMERICAL METHODS; OPTICAL PROPERTIES; POLARIZATION; SCANNING; TARGETS; WINDOWS;

(MIN ,MAX ,+) FUNCTIONS; APPLIED (CO); FOCUS WINDOW; HARDWARE DESIGNS; INTENSE (CO); MEMORY CELLS; OPTICAL (PET) (OPET); OPTICAL MICRO LITHOGRAPHY; OPTIMIZATION CONDITIONS; OPTIMIZATION TOOLS; PERIPHERAL (SPI); RESIST SIMULATION; SOLUTION SPACES;

OPTIMIZATION;

EID: 45449112781     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771369     Document Type: Conference Paper

References (4)

1. Tsujita, et al., "illumination optimization with actual information of exposure tool and resist process," Proc. SPIE 6520, (2007)
2. Rosenbluth, et al., "Optimum Mask and Source Patterns to Print a Given Shape," Proc. SPIE 4346, (2001)
3. Socha, et al., "Simultaneous Source Mask Optimization," Proc. SPIE 5853, (2005)
4. Renwick, et al., "Characterizing a scanner illuminator for prediction of OPE effect," Proc. SPIE 6154, (2006)