Mask characterization for double patterning lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Bubke, Karsten ^a   Cotte, Eric ^a   Peters, Jan Hendrik ^a   De Kruif, Robert ^b   Dusa, Mircea ^c   Fochler, Joerg ^d   Connolly, Brid ^d  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

^b ASML   (Netherlands)

^c ASML US Inc   (United States)

^d Toppan Photomasks Inc   (United States)

Author keywords

Double patterning; Mask metrology; Overlay; Registration

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; OPTICAL VARIABLES MEASUREMENT; SEMICONDUCTOR DEVICE MANUFACTURE; THROUGHPUT;

DOUBLE PATTERNING (DPT) LITHOGRAPHY; EXPOSURE TOOL CAPABILITY; MASK METROLOGY; OVERLAY;

MASKS;

EID: 42149141975     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.747006     Document Type: Conference Paper

References (12)

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