Superhardness effect and high temperature oxidation resistance of AlN/SiO2 nano-multilayers

Wuji Cailiao Xuebao/Journal of Inorganic Materials

Volumn 23, Issue 3, 2008, Pages 562-566

  Wu, Ying ^a   Zhao, Wen Ji ^a   Kong, Ming ^a   Huang, Bi Long ^a   Li, Ge Yang ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

AlN SiO2 multilayer; Epitaxial growth; Oxidation resistance; Superhardness effect

Indexed keywords

ALUMINUM COMPOUNDS; ANNEALING; EPITAXIAL GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROSTRUCTURE; NANOINDENTATION; NANOSTRUCTURED MATERIALS; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SILICA; THERMOOXIDATION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE/SILICA MULTILAYER; REACTIVE MAGNETRON SPUTTERING; SUPERHARDNESS EFFECT;

MULTILAYER FILMS;

EID: 45449093817     PISSN: 1000324X     EISSN: None     Source Type: Journal    
DOI: 10.3724/SP.J.1077.2008.00562     Document Type: Article

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