Process development for high scan speed ArF immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Matsumura, Nobuji ^a   Sugie, Norihiko ^a   Goto, Kentaro ^a   Fujiwara, Koichi ^a   Yamaguchi, Yoshikazu ^a   Tanizaki, Hirokazu ^b   Nakano, Katsushi ^b   Fujiwara, Tomoharu ^b   Wakamizu, Shinya ^c   Takeguchi, Hirofumi ^c   Arima, Hiroshi ^c   Kyoda, Hideharu ^c   Yoshihara, Kosuke ^c   Kitano, Junichi ^c  

^a JSR CORPORATION   (Japan)

^b NIKON CORPORATION   (Japan)

^c TOKYO ELECTRON LTD   (Japan)

Author keywords

CD uniformity; Defects; Immersion lithography; Non top coat process; Top coat process

Indexed keywords

CONTACT ANGLE; MACHINE TOOLS; PHOTOLITHOGRAPHY; PRODUCTION ENGINEERING; SPEED; TECHNOLOGY; THROUGHPUT;

193NM IMMERSION LITHOGRAPHIES; ARF IMMERSION LITHOGRAPHIES; CD UNIFORMITIES; CD UNIFORMITY; COST OF OWNERSHIPS; DEFECTIVITY; DRY LITHOGRAPHIES; HIGH SPEEDS; HIGH THROUGHPUTS; IMMERSION EXPOSURES; IMMERSION LITHOGRAPHIES; IMMERSION LITHOGRAPHY; MASS PRODUCTION PROCESSES; MASS PRODUCTIONS; NON TOP COAT PROCESS; PROCESS DEVELOPMENTS; RECEDING CONTACTS; SCANNING PROCESSES; SCANNING SPEEDS; TECHNOLOGY INFRASTRUCTURES; TOP COAT PROCESS; TRACK SYSTEMS; VOLUME PRODUCTIONS;

SCANNING;

EID: 45449084986     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771795     Document Type: Conference Paper

References (6)

1. Ralph R. Dammel, Georg Pawloski, Andrew Romano, Frank M. Houlihan, Woo-Kyu Kim, Raj Sakamuri, David Abdallah, "Resist Component Leaching In 193 nm Immersion Lithography", Proceeding of SPIE 2005
2. Katsushi Nakano, Hiroshi Kato, Soichi Owa, "Immersion defectivity control by optimizing immersion materials and processes", Proceeding SPIE, 2007
3. Katsushi Nakano, Hiroshi Kato, Tomoharu Fujiwara, K. Shiraishi, Yasuhiro Iriuchijima, Soichi Owa, Irfan Malik, Steve Woodman, Prasad Terala, Christine Pelissier, and Haiping Zhang, "Immersion defectivity study with volume production immersion lithography tool", Proceeding SPIE, 2007
4. Jun Ishikawa, Tomoharu Fujiwara, Kenichi Shiraishi, Yuuki Ishii, Masahiro Nei, "Latest results from the hyper-NA immersion scanners S609B and S610C", Proceeding SPIE, 2007
5. Hiroki Nakagawa, Kentarou Goto, Motoyuki Shima, Junichi Takahashi and Tsutomu Shimokawa, "Process optimization for developer soluble immersion topcoat material", Proceeding SPIE, 2007
6. Daniel P. Sanders, Linda K. Sundberg, Ratnam Sooriyakumaran, Philip J. Brock, Richard A., DiPietro, Hoa D. Truong, Dolores C. Miller, Margaret C. Lawson, Robert D. Allen, "Fluoroalcohol Materials with Tailored Interfacial Properties for Immersion Lithography", Proceeding SPIE, 2007