Process optimization for developer soluble immersion topcoat material

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Nakagawa, Hiroki ^a   Goto, Kentarou ^a   Shima, Motoyuki ^a   Takahashi, Junichi ^a   Shimokawa, Tsutomu ^a   Ichino, Katsunori ^b   Nagatani, Naohiko ^b   Kyoda, Hideharu ^b   Yoshihara, Kosuke ^b  

^a JSR CORPORATION   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

193 nm immersion lithography; Chemical cost; Coating process; Developer soluble type topcoat material

Indexed keywords

COATING TECHNIQUES; LEACHING; LITHOGRAPHY; OPTIMIZATION; PROCESS CONTROL; SEMICONDUCTOR DEVICES;

CHEMICAL COSTS; COATING PROCESS; IMMERSION LITHOGRAPHY; TOPCOAT FILMS; TOPCOAT MATERIALS;

COATINGS;

EID: 35148830472     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711858     Document Type: Conference Paper

References (5)

1. Hiroki Nakagawa, Kenji Hoshiko, Motoyuki shima, Shiro Kusumoto and Tsutomu Shimokawa, "Immersion Topcoat and Resist Material Improvement Study Using Immersion Scanner", Proceeding of SPIE 2006
2. Hiroki Nakagawa, Kenji Hoshiko, Motoyuki Shima, Shiro Kusumoto and Tsutomu Shimokawa Katsushi Nakano, Tomoharu Fujiwara and Soichi Owa Immersion Top-coat and Resist Material Improvement Study by Using Immersion Scanner" Proceeding of SPIE 2006
3. Masashi Enomoto, Shinichi Hatakeyama, Takafumi Niwa, Tadatoshi Tomita, Hideharu Kyoda, Junichi Kitano, Satoru Shimura and Tetsu Kawasaki, "193nm Immersion process Defect Generation and Reduction Mechanism Investigation using analytical methods", Proceeding of SPIE 2006
4. Tadatoshi Tomita, Takeshi Shimoaoki, Masashi Enomoto, Hideharu Kyoda, Junichi Kitano and Toshifumi Suganaga, "An Investigation on Defect-generation Conditions in Immersion Lithography", Proceeding of SPIE 2006
5. Hideharu Kyoda, "Process optimization to identify immersion issues", Proceeding of 2nd International Symposium on Immersion Lithography 2005