Latest results from the hyper-NA immersion scanners S609B and S610C

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 2, 2007, Pages

  Ishikawa, Jun ^a   Fujiwara, Tomoharu ^a   Shiraishi, Kenichi ^a   Ishii, Yuuki ^a   Nei, Masahiro ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

ArF exposure tool; Hyper NA; Immersion; Tandem stage; The NSR S609B; The NSR S610C

Indexed keywords

CASCADE CONNECTIONS; LENSES; LIGHT POLARIZATION; OPTIMIZATION; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; THERMAL EFFECTS;

HYPER-NA; IMMERSION; INTEGRATED PROJECTION OPTICS TESTER (IPOT); TANDEM STAGE;

SCANNING;

EID: 35148833122     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712042     Document Type: Conference Paper

References (2)

1. T. Fujiwara, J. Ishikawa, T. Kawakubo, Y. Ishii, H. Kyoda, S. Wakamizu and T. Shimoaoki, Nikon Corp, Tokyo electron Kyushu LTD, "Adapting immersion exposure to mass production by adopting a cluster of novel resistcoating/developing and immersion-exposure equipment." SPIE 2007 [6519-11]
2. K. Nakano, H. Kato, T. Fujiwara, K. Shiraishi, S. Owa, I. Malic, S. Woodman, P. Terala, C. Pelissier and H. Zhang, Nikon Corp, KLA-Tencor Corp. "Immersion defectivity study with volume production immersion lithography tool" SPIE 2007 [6520-42]