Atomistic study of nickel silicide structures on Si(100) by tunneling microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 2947-2951

  Ono, Izumi ^a   Yoshimura, Masamichi ^a   Ueda, Kazuyuki ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4544336530     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590324     Document Type: Article

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