Nanostructuring of silicate glass under low-energy Ag-ion implantation

Surface Science

Volumn 566-568, Issue 1-3 PART 2, 2004, Pages 1250-1254

  Stepanov, A L ^a,b,d   Popok, V N ^c  

^a ZAVOISKY PHYSICAL TECHNICAL INSTITUTE   (Russian Federation)

^b RWTH AACHEN UNIVERSITY   (Germany)

^c UNIVERSITY OF GOTHENBURG   (Sweden)

^d UNIVERSITY OF GRAZ   (Austria)

Author keywords

Atomic force microscopy; Glass surfaces; Ion implantation; Silicon oxides; Silver; Sputtering

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; DIELECTRIC DEVICES; ELECTRIC CURRENTS; GIBBS FREE ENERGY; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; PLASMAS; SILVER; SOL-GELS; SPECTROSCOPY; SPUTTERING;

GLASS SURFACE; LOW-ENERGY; NANOSTRUCTURING; NONLINEAR OPTICAL DEVICES;

GLASS;

EID: 4544246535     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.06.141     Document Type: Article

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