Depth distribution of Cu, Ag and Au ions implanted at low energy into insulators

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 166, Issue , 2000, Pages 26-30

  Stepanov, A L ^a,b   Zhikharev, V A ^a   Hole, D E ^b   Townsend, P D ^b   Khaibullin, I B ^a  

^a ZAVOISKY PHYSICAL TECHNICAL INSTITUTE   (Russian Federation)

^b UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COPPER; GLASS; GOLD; IMPURITIES; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; RADIATION EFFECTS; SILICA; SILVER; SPUTTERING;

ION BEAM MIXING;

ELECTRIC INSULATING MATERIALS;

EID: 0033737870     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00641-2     Document Type: Article

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