|
Volumn 11, Issue 3, 2007, Pages 233-242
|
Electron holography as characterization tool for 2-D analysis of p-n junctions
a a a a a
a
IBM
(United States)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ELECTRON HOLOGRAPHY;
ELECTRONS;
FAILURE (MECHANICAL);
FAILURE ANALYSIS;
HOLOGRAMS;
LASER RECORDING;
SEMICONDUCTOR LASERS;
SEMICONDUCTOR MATERIALS;
CHARACTERIZATION TOOLS;
DOPANT DIFFUSION;
ELECTRON HOLOGRAMS;
INTEGRATION SCHEME;
PHYSICAL FAILURE ANALYSIS;
PROCESS INTEGRATION;
QUANTITATIVE INFORMATION;
SOI STRUCTURE;
SEMICONDUCTOR JUNCTIONS;
|
EID: 45249106374
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.2778667 Document Type: Conference Paper |
Times cited : (1)
|
References (13)
|