Delineation of crystalline defects in semiconductor substrates and thin films by chemical etching techniques

ECS Transactions

Volumn 11, Issue 3, 2007, Pages 195-206

  Kolbesen, B O ^a   Mahliss J ^a   Possner, D ^a  

^a GOETHE UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; CHROMIUM METALLOGRAPHY; DEFECTS; ETCHING; HYDROFLUORIC ACID; NANOCRYSTALLINE MATERIALS; ORGANIC ACIDS; OXIDATION; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; TOXIC MATERIALS;

CHEMICAL ETCHING TECHNIQUE; CRYSTAL QUALITIES; CRYSTALLINE DEFECTS; HIGH SENSITIVITY; LIGHT OPTICAL MICROSCOPIES; OXIDIZING AGENTS; PREFERENTIAL ETCHING; VACANCY AGGLOMERATES;

SUBSTRATES;

EID: 45249091882     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2778662     Document Type: Conference Paper

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