SiOx layer formation during plasma sputtering of Si and SiO 2 targets

Semiconductors

Volumn 42, Issue 6, 2008, Pages 731-736

  Karpov, A N ^a   Marin, D V ^b   Volodin, V A ^b   Jedrzejewski, J ^c   Kachurin, G A ^b   Savir, E ^c   Shwartz, N L ^b   Yanovitskaya, Z Sh ^b   Balberg, I ^c   Goldstein, Y ^c  

^a NOVOSIBIRSK STATE UNIVERSITY   (Russian Federation)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^c HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 45249086562     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/S106378260806016X     Document Type: Article

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