A microfocus x-ray source based on a nonmetal liquid-jet anode

Applied Physics Letters

Volumn 92, Issue 23, 2008, Pages

  Tuohimaa, T ^a   Ewald, J ^a   Schlie, M ^a   Fernandez Varea J M ^b   Hertz, H M ^a   Vogt, U ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHARGED PARTICLES; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRON SOURCES; ELECTRONS; FARM BUILDINGS; LUMINANCE; METHANOL; OPTICAL PROPERTIES; PARTICLE BEAMS; X RAY APPARATUS; X RAYS;

ELECTRON IMPACT (EI); HIGH-BRIGHTNESS (HB); LIQUID JETS; MICROFOCUS X-RAY; SPECTRAL BRIGHTNESS; STABLE OPERATIONS; X-RAY EMISSIONS; X-RAY SOURCES;

X RAY ANALYSIS;

EID: 45149105282     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2942379     Document Type: Article

References (23)

1. See, e.g., MicroXCT, nanoXCT (www.xradia.com).
2. S. W. Wilkins, T. E. Gureyev, D. Gao, A. Pogany, and A. W. Stevenson, Nature (London) 384, 335 (1996).
3. V. E. Coslett and W. C. Nixon, Nature (London) 168, 24, (1951).
4. M. Wolkenhauer, G. G. Bumbu, Y. Cheng, S. V. Roth, and J. S. Gutmann, Appl. Phys. Lett. 89, 054101 (2006).
5. P. A. Lynch, A. W. Stevenson, D. Liang, D. Parry, and S. Wilkins, Rev. Sci. Instrum. 78, 023904 (2007).
6. T. Tuohimaa, M. Otendal, and H. M. Hertz, Appl. Phys. Lett. 91, 074104 (2007).
7. D. E. Grider, A. Wright, and P. K. Ausburn, J. Phys. D: Appl. Phys. 19, 2281 (1986).
8. O. Hemberg, M. Otendal, and H. M. Hertz, Appl. Phys. Lett. 83, 1483 (2003).
9. O. Hemberg, M. Otendal, and H. M. Hertz, Opt. Eng. (Bellingham) 43, 1682 (2004).
10. M. Otendal, T. Tuohimaa, and H. M. Hertz, Rev. Sci. Instrum. 79, 016102 (2008).
11. B. Buijsse, Proc. SPIE 4502, 74 (2001).
12. M. Otendal, T. Tuohimaa, and H. M. Hertz, J. Appl. Phys. 101, 026102 (2007).
13. J. Pankert, R. Apetz, K. Bergmann, G. Derra, M. Janssen, J. Jonkers, J. Klein, T. Krücken, A. List, M. Loeken, C. Metzmacher, W. Neff, S. Probst, R. Prümmer, O. Rosier, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, and O. Zitzen, Proc. SPIE 5751, 260 (2005).
14. F. Salvat, J. M. Fernández-Varea, and J. Sempau, PENELOPE-2006 A Code System for Monte Carlo Simulation of Electron and Photon Transport (OECD, Nuclear Energy Agency, Issy-les-Moulineaux, France, 2006).
15. See, e.g. (http://www.a-p-tech.com/grcathodes.htm).
16. LORENTZ2EM v.6.2 (www.integratedsoft.com).
17. XR-100T-CZT (www.amptek.com).
18. J. Reinspach, " Contact Lithography for X-ray Optics.," M.S. Thesis, Royal Institute of Technology, 2007.
19. X. Llovet, J. M. Fernández-Varea, J. Sempau, and F. Salvat, Surf. Interface Anal. 37, 1054 (2005).
20. H. Schwarz, J. Appl. Phys. 35, 2020 (1964).
21. M. Otendal, O. Hemberg, T. T. Tuohimaa, and H. M. Hertz, Exp. Fluids 39, 799 (2005).
22. P. A. C. Jansson, U. Vogt, and H. M. Hertz, Rev. Sci. Instrum. 76, 043503 (2005).
23. R. Lebert, K. Bergmann, G. Schriever, and W. Neff, Microelectron. Eng. 46, 465 (1999).