Phase transformation and resistivity of dumbbell-like ZnO microcrystals under high pressure

Journal of Applied Physics

Volumn 103, Issue 11, 2008, Pages

  Yu, Cuiling ^a   Yu, Qingjiang ^a   Gao, Chunxiao ^a   Yang, Haibin ^a   Liu, Bao ^a   Peng, Gang ^a   Han, Yonghao ^a   Zhang, Dongmei ^a   Cui, Xiaoyan ^a   Liu, Cailong ^a   Wang, Yue ^a   Wu, Baojia ^a   He, Chunyuan ^a   Huang, Xiaowei ^a   Zou, Guangtian ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMONDS; ELECTRIC RESISTANCE; HIGH PRESSURE ENGINEERING; MEASUREMENTS; MICROCRYSTALS; NANOSTRUCTURES; PRESSURE; THERMOELECTRICITY; ZINC ALLOYS; ZINC OXIDE;

(A) PHASE TRANSFORMATION; (I ,J) CONDITIONS; AMERICAN INSTITUTE OF PHYSICS (AIP); APPLIED PRESSURE; DIAMOND ANVIL CELL (DAC); ELECTRICAL RESISTIVITIES; HIGH PRESSURE (HP); IN-SITU; MILD CONDITIONS; PHASE TRANSITION; PRESSURE DEPENDENCE; RAMAN SPECTRUM; ROCKSALT (RS) STRUCTURE; ROOM-TEMPERATURE (RT); SOLUTION METHODS; TRANSITION (JEL CLASSIFICATIONS:E52 ,E41 ,E31); WURTZITE (WZ);

SEMICONDUCTING ZINC COMPOUNDS;

EID: 45149092656     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2931039     Document Type: Article

References (36)

1. Z. K. Tang, G. K. L. Wong, P. Yu, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.121620 72, 3270 (1998).
2. H. Cao, J. Y. Xu, E. W. Seeling, and R. P. H. Chang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.126557 76, 2997 (2000); H. Cao, J. Y. Xu, E. W. Seeling, and R. P. H. Chang, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.84.5584 84, 5584 (2000).
3. H. Y. Xu, Y. C. Liu, Y. X. Liu, C. S. Xu, C. L. Shao, and R. Mu, Appl. Phys. B: Lasers Opt. APBOEM 0946-2171 10.1007/s00340-005-1790-9 80, 871 (2005).
4. Y. Yoshino, T. Makino, Y. Katayama, and T. Hata, Vacuum VACUAV 0042-207X 10.1016/S0042-207X(00)00313-4 59, 538 (2000).
5. C. R. Gorla, N. W. Emanetoglu, S. Liang, W. E. Mayo, Y. Lu, M. Wraback, and H. Shen, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.369577 85, 2595 (1999).
6. J. B. Lee, H. J. Kim, S. G. Kim, C. S. Hwang, S. -H. Hong, Y. H. Shin, and N. H. Lee, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(03)00347-X 435, 179 (2003).
7. H. Y. Xu, Y. C. Liu, R. Mu, C. L. Shao, Y. M. Lu, D. Z. Shen, and X. W. Fan, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1884256 86, 123107 (2005).
8. M. Yoshimoto, S. Takagi, Y. Umemura, M. Hada, and H. Nakatsuji, J. Catal. JCTLA5 0021-9517 10.1006/jcat.1997.1889 173, 53 (1998).
9. H. W. Lehmann and R. Widmer, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1662864 44, 3868 (1973).
10. K. Keis, E. Magnusson, H. Lindstrom, S. E. Lindquist, and A. Hagfeldt, Sol. Energy Mater. Sol. Cells SEMCEQ 0927-0248 10.1016/S0927-0248(01)00110-6 73, 51 (2002).
11. M. H. Huang, S. Mao, H. Feick, H. Q. Yan, Y. Y. Wu, H. Kind, E. Weber, R. Russo, and P. D. Yang, Science SCIEAS 0036-8075 10.1126/science.1060367 292, 1897 (2001).
12. L. Guo, Y. L. Ji, and H. Xu, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja027947g 124, 14864 (2002).
13. Z. W. Pan, Z. R. Dai, and Z. L. Wang, Science SCIEAS 0036-8075 10.1126/science.1058120 291, 1947 (2001).
14. B. P. Zhang, N. T. Binh, K. Wakatsuki, Y. Segawa, Y. Yamada, N. Usami, M. Kawasaki, and H. Koinuma, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp048602i 108, 10899 (2004).
15. H. Yan, R. He, J. Johnson, M. Law, R. J. Saykally, and P. Yang, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja034327m 125, 4728 (2003).
16. Y. Dai, Y. Zhang, Q. K. Li, and C. W. Nan, Chem. Phys. Lett. CHPLBC 0009-2614 10.1016/S0009-2614(02)00582-1 358, 83 (2002).
17. K. Govender, D. S. Boyle, P. B. Kenway, and P. O'Brien, J. Mater. Chem. JMACEP 0959-9428 10.1039/b404784b 14, 2575 (2004).
18. W. Shan, W. Walukiewicz, J. W. Ager III, K. M. Yu, Y. Zhang, S. S. Mao, R. Kling, C. Kirchner, and A. Waag, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1901827 86, 153117 (2005).
19. S. J. Chen, Y. C. Liu, C. L. Shao, C. S. Xu, Y. X. Liu, L. Wang, B. B. Liu, and G. T. Zou, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2132519 98, 106106 (2005).
20. J. Huso, J. L. Morrison, H. Hoeck, X. B. Chen, L. Bergman, S. J. Jokela, M. D. McCluskey, and T. Zheleva, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2369917 89, 171909 (2006).
21. F. H. Su, Y. F. Liu, W. Chen, W. J. Wang, K. Ding, G. H. Li, A. G. Joly, and D. E. McCready, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2206705 100, 013107 (2006).
22. S. J. Chen, Y. C. Liu, C. L. Shao, C. S. Xu, Y. X. Liu, C. Y. Liu, B. P. Zhang, L. Wang, B. B. Liu, and G. T. Zou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2191884 88, 133127 (2006).
23. Q. Yu, C. Yu, H. Yang, W. Fu, L. Chang, J. Xu, R. Wei, H. Li, H. Zhu, M. Li, G. Zou, G. Wang, C. Shao, and Y. Liu, Inorg. Chem. INOCAJ 0020-1669 10.1021/ic070008a 46, 6204 (2007).
24. G. J. Piermarini, S. Block, J. D. Barnett, and R. A. Forman, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.321957 46, 2774 (1975).
25. C. X. Gao, Y. H. Han, Y. Z. Ma, A. White, H. W. Liu, J. F. Luo, M. Li, C. Y. He, A. M. Hao, X. W. Huang, Y. W. Pan, and G. T. Zou, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.2006347 76, 083912 (2005).
26. Y. H. Han, C. X. Gao, Y. Z. Ma, H. W. Liu, Y. W. Pan, J. F. Luo, M. Li, C. Y. He, X. W. Huang, and G. T. Zou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1863444 86, 064104 (2005).
27. L. J. van der Pauw, Philips Res. Rep. PRREA9 0031-7918 13, 1 (1958).
28. JCPDS Card No. 36-1451
29. F. Decremps, J. P. Porres, A. M. Saitta, J. C. Chervin, and A. Polian, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.65.092101 65, 092101 (2002).
30. J. M. Calleja and M. Cardona, Phys. Rev. B PLRBAQ 0556-2805 10.1103/PhysRevB.16.3753 16, 3753 (1977).
31. R. Cuscó, E. Alarcón-Lladó, J. Ibáez, L. Artús, J. Jiḿnez, B. Wang, and M. J. Callahan, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.75.165202 75, 165202 (2007).
32. C. H. Bates, W. B. White, and R. Roy, Science SCIEAS 0036-8075 10.1126/science.137.3534.993 137, 993 (1962).
33. J. Z. Jiang, J. S. Olsen, L. Gerward, D. Frost, D. Rubie, and J. Peyronneau, Europhys. Lett. EULEEJ 0295-5075 10.1209/epl/i2000-00233-9 50, 48 (2002).
34. P. Bolsaitis and I. L. Spain, in High Pressure Technology, edited by, I. L. Spain, and, J. Paauwe, (Dekker, New York, 1977), Vol. 1, p. 477.
35. J. A. Sans, A. Segura, F. J. Segura, F. J. Manjón, B. Marí, A. Muoz, and M. J. Herrera-Cabrera, Microelectron. J. MICEB9 0026-2692 10.1016/j.mejo.2005.05.010 36, 928 (2005).
36. J. N. Wickham, A. B. Herhold, and A. P. Alivisatos, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.84.923 84, 923 (2000).