Deposition behaviors and patterning of TiO2 thin films on different SAMs surfaces from titanium sulfate aqueous solution

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 324, Issue 1-3, 2008, Pages 137-142

  Liang, Shan ^a,b   Chen, Miao ^a   Xue, Qunji ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Anatase; Anion; Electrostatic interaction; Stern layer; Van der Vaals forces

Indexed keywords

NEGATIVE IONS; SOLUTIONS; SURFACE ANALYSIS; TITANIUM DIOXIDE;

ELECTROSTATIC INTERACTION; STERN LAYER; VAN DER VAALS FORCES;

THIN FILMS;

HYDROGEN PEROXIDE; HYDROXYL GROUP; METHYL GROUP; SULFONIC ACID DERIVATIVE; TITANIUM DERIVATIVE; TITANIUM DIOXIDE; TITANIUM SULFATE;

AQUEOUS SOLUTION; ARTICLE; ELECTRICITY; ELECTRON; FILM; MOLECULAR DYNAMICS; PARTICLE SIZE; PRIORITY JOURNAL; SURFACE PROPERTY;

EID: 45049087158     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2008.04.032     Document Type: Article

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